Lid attach optimization to limit electronic package warpage

ABSTRACT

In yet another aspect the electronic package further includes a frame concentric with the chip. The lid is attached to the frame with a solder, epoxy or elastomer and placed on the chip with a thermal interface material. The seal band material is dispensed on the chip carrier and the frame is then moved towards the chip carrier allowing a minimum seal band thickness.

FIELD OF THE EMBODIMENTS

Embodiments of the present invention generally relate to electronicdevices and more specifically to lid attach techniques to limit warpagewithin an electronic device package.

DESCRIPTION OF THE RELATED ART

An electronic package may include an integrated circuit (IC) chip,semiconductor die, processing module, and the like, packaged onto acarrier or substrate. This electronic package may be encapsulated by acover having high thermal conductivity attached to the carrier by a sealband. Flatness of the package is important to ensure reliable higherlevel device packaging. For example, it is important that the carrier beflat to ensure a reliable electrical connection with a system board andit is important that the cover be flat to ensure a reliable thermalconnection with a heat spreader, such as a heat sink.

The electronic device that contains the electronic package generallyoperates at an elevated temperature since the energy utilized to powerthe electronic device is converted to heat. Electronic package warpagemay be caused by coefficient of thermal expansion (CTE) mismatches ofthe various components the package. The mismatched CTE results in thevarious components expanding and contracting at differing rates.

Known solutions to reduce the package warpage include choosing like CTEmaterials that make up the electronic package, increasing the thicknessor stiffness of carrier or lid, and decreasing the thickness of the sealband. Choosing like CTE materials to reduce expansion mismatch islimited since the electrical, mechanical or thermal performance of thepackage should not detrimentally affected by selecting like CTEmaterials. Increasing the thickness of the laminate or lid usually leadsto higher cost and higher stress in other parts of the package such asthe chip contacts electrically connecting the chip and the carrier,underfill between the chip and the carrier surrounding the contacts, andthermal interface material (TIM) between the chip and the lid.Decreasing the thickness of the seal band may be limited because oflarge openings that exist between the lid and the carrier or because theseal band thickness is already minimized.

SUMMARY

In an embodiment of the present invention, an electronic packageclaimed. The electronic package includes a carrier comprising a topsurface and a bottom surface. The electronic package further includes aframe comprising an opening upon the carrier. The frame includes a firstframe side and second frame side. The first frame side includes a topsurface coplanar with a top surface of a lid. The second frame sideincludes a top surface below the top surface of the lid. The electronicpackage further includes a semiconductor chip electrically connected tothe top surface within and concentric with the opening. The lidthermally connected to a top surface of the semiconductor chip. Theelectronic package further includes join material that connects the lidand the frame.

These and other embodiments, features, aspects, and advantages willbecome better understood with reference to the following description,appended claims, and accompanying drawings.

BRIEF DESCRIPTION OF THE FIGURES

So that the manner in which the above recited features of the presentinvention are attained and can be understood in detail, a moreparticular description of the invention, briefly summarized above, maybe had by reference to the embodiments thereof which are illustrated inthe appended drawings.

It is to be noted, however, that the appended drawings illustrate onlytypical embodiments of this invention and are therefore not to beconsidered limiting of its scope, for the invention may admit to otherequally effective embodiments.

FIG. 1 depicts an electronic device utilizing a prior art electronicpackage.

FIG. 2A-FIG. 2C depict views of an exemplary electronic package,according to one or more embodiments of the present invention.

FIG. 3A-FIG. 3C depict views of an exemplary electronic package,according to one or more embodiments of the present invention.

FIG. 4A depicts an isometric portion view of an exemplary electronicpackage topographic lid, according to one or more embodiments of thepresent invention.

FIG. 4B-FIG. 4C depict views of an exemplary electronic packageincluding the topographic lid, according to one or more embodiments ofthe present invention.

FIG. 5A-FIG. 5E depict views of an exemplary electronic package,according to one or more embodiments of the present invention.

FIG. 6-FIG. 9 depict exemplary methods of fabricating an electronic,according to one or more embodiments of the present invention.

DETAILED DESCRIPTION

FIG. 1 depicts a prior art electronic device 100 utilizing electronicpackage 124. Electronic device 100 may be, for example, a computer,server, mobile device, tablet, and the like. Electronic package 124includes IC chip 102, carrier 108, interconnects 122, underfill 110,thermal interface material 112, lid 116, and seal band adhesive 120.Chip 102 may be an integrated circuit, semiconductor die, processor,microchip, and the like. Carrier 108 may be an organic carrier or aceramic carrier and provides mechanical support for chip 102 andelectrical paths from the upper surface of carrier 108 to the opposingside of carrier 108. Interconnects 122 electrically connect chip 102 andthe upper side of carrier 108 and may be a wire bond, solder bond, stud,conductive ball, conductive button, and the like. Underfill 110 may beelectrically-insulating, may substantially surround interconnects 122,may electrically isolate individual interconnects 122, and may providemechanical support between chip 102 and carrier 108. Underfill 110 mayalso prevent damage to individual interconnects 122 due to thermalexpansion mismatches between chip 102 and carrier 108.

When chip 102 is seated upon carrier 108, a reflow process may beperformed to join interconnects 122 to electrical contacts of both chip122 and carrier 108. After chip 102 is seated to carrier 108 a lid 116is attached to carrier 108 with seal band adhesive 120 to cover chip102. Generally, during operation of electronic device 100, heat needs tobe removed from chip 102. In this situation, lid 116 is both a cover anda conduit for heat transfer. As such, a thermal interface material 112may thermally join lid 116 and chip 102.

Electronic package 124 may be connected to a system board 106 viainterconnects 114. System board 106 may be the main printed circuitboard of electronic device 100 and includes other electronic devicecomponents, such as a graphics processing unit, memory, and the like,and provides connectors for other peripherals. Interconnects 114electrically connect the lower side of carrier 108 to system board 106and may be a wire bond, solder bond, stud, conductive ball, conductivebutton, and the like. Interconnects 114 may be larger and thus morerobust than interconnects 122. When electronic package 124 is seatedupon system board 106 a second reflow process may be performed to joininterconnects 114 to electrical contacts of both carrier 108 and systemboard 106.

In another implementation, the electronic package 124 may beelectrically connected to the system board 106 via a socket (not shown).In this implementation, the socket includes interconnects and may besoldered or otherwise placed upon system board 106. The electronicpackage 124 may be subsequently inserted into the socket to establishelectrical connection between interconnects 114 and the socketinterconnects to provide for electrical communication between theelectronic package 124 and the system board 106.

To assist in the removal of heat from chip 102 a heat sink 104 may bethermally joined to electronic package 124 via thermal interfacematerial 118. Heat sink 104 may be a passive heat exchanger that coolschip 102 by dissipating heat into the surrounding air. As such, duringoperation of electronic device 100, a thermal path exists from chip 102to heat sink 104 through thermal interface material 112, lid 116, andthermal interface material 118, and the like. Heat sink 104 may beconnected to system board 106 via one or more connection device 130.Connection device 130 may include a threaded fastener 132, standoff 134,backside stiffener 136, and fastener 138. Threaded fastener 132 mayextend through heat sink 104, standoff 134, and backside stiffener 136and provides compressive force between heat sink 104 and backsidestiffener 136. The length of standoff 134 may be selected to limit thepressure exerted upon electronic package 124 by heat sink 104 created bythe compressive forces. Backside stiffener 136 may mechanically supportthe compressive forces by distributing the forces across a larger areaof motherboard 106. In other applications, connection device 130 may bea clamp, non-influencing fastener, cam, and the like, system thatadequately forces heat sink 104 upon electronic package 124.

Thermally connected, joined, and the like, shall herein mean thatelements that which are thermally connected are able to efficientlytransfer heat there between (e.g., air gaps between the elements areminimized). In some instances, elements that are thermally connected arenot directly in physical contact with each other, but rather, areindirectly in contact with each via a thermal interface material. Inother instances, elements that are thermally connected are in physicalcontact with each other. Electrically connected, and the like, shallherein mean that current is able to be efficiently passed from oneelement to another element (e.g., current flows from a conductor in oneelement to a conductor in the other element).

FIG. 2A-FIG. 2C depict views of an exemplary electronic package 200.FIG. 2A depicts a top view of electronic package 200. FIG. 2B and FIG.2C depict cross section views of alternative implementations ofelectronic package 200. Electronic package 200 may include IC chip 202,carrier 208, interconnects 222, underfill 210, thermal interfacematerial 212, lid 216, and seal band 203. For clarity, some of theelements of FIG. 2A-FIG. 2C are omitted in another FIG. 2A-FIG. 2C tobetter depict one or more features described below.

Carrier 208 provides a base on which the chip 202 is mounted andelectrically connected thereto via a plurality of interconnects 222.Interconnects 222 may be solder, pillars, wire bonds, studs, buttons, orthe like. In a particular embodiment, interconnects are C4interconnects. Carrier 208 may be composed of ceramics or organicmaterials. If organic, carrier 208 may include multiple layers ofmetallization and dielectric materials. Depending upon the configurationof layers, carrier 208 may be a coreless, thin core, or standard coredesign. The dielectric materials may be, for example, epoxy resin withor without fiberglass fill. In various embodiments, carrier 208 mayinterconnect with other devices such as a socket (pin grid array, landgrid array, ball grid array, and the like) via e.g., contacts 114 (notshown). In various embodiments, carrier 208 may include other devicesbesides chip 202, for example, surface mount devices (e.g. capacitors,resistors, and the like).

Chip 202 may be for example a microchip, microprocessor, graphicprocessor, combined processor and graphics processor, applicationspecific integrated circuit (ASIC), system on a chip (SOC), threedimensional integrated circuit, system on insulator (SOI), FieldProgrammable Gate Array (FPGA), and the like.

Lid 216 is thermally connected to the chip 202. The bottom surface oflid 216 is configured to make thermal contact with chip 202. In certainembodiments, lid 216 has a planar bottom surface. The upper surface oflid 216 is configured to thermally contact heat sink 104. In certainembodiments, lid 216 has a planar upper surface. Lid 216 may bemechanically bonded and thermally connected to carrier 208 by seal band203. Lid 216 may be made from a thermally conductive material, such as ametal. For example, lid 216 may be formed (e.g., milled, cast, and thelike) from copper.

Seal band 203 generally fills the air gap that exists between theperimeter of lid 216 and carrier 208. Seal band 203 includes a shim 209and seal-band material 205. Shim 209 is a space filler that fills themajority of the dimension that exists between the perimeter of lid 216and carrier 208. For example, if the carrier 208 is separated from thelid 216 by 1 centimeter, shim 209 has a height of at least 50 mm. Thethickness of the shim 209 may be determined by considering one or moreseal-band material 205 thicknesses to achieve optimal heat transferbetween the shim 209 and either lid 216 and/or carrier 208. Thethickness of the shim 209 may therefore be the difference between thedimension between the perimeter of lid 216 and carrier 208 and the oneor more seal-band material thicknesses. For example, as exemplarydepicted in FIG. 2B, it may be determined that heat transfer ismaximized between lid 216 and shim 209 and between shim 209 and carrier208 when seal-band material is 5 mm. Therefore, if the carrier 208 isseparated from the lid 216 by 1 centimeter, the thickness of shim 209 is90 mm.

Shim 209 is generally positioned within the gap that exists between theperimeter of lid 216 and carrier 208 subsequent to lid 216 beingthermally connected to chip 202. Therefore, shim 209 includes at leasttwo members 211 and 213. In another implementation, shim 209 includesfour members, etc. When the members of shim 209 are combined, shim 209has a similar perimeter shape relative to chip 202. For example, if chip202 has a square perimeter shape shim 209 also has a square perimetershape, if chip 202 has a hexagon perimeter shape shim 209 also has ahexagon perimeter shape. When the members of shim 209 are combined, shim209 includes a concentric opening of a similar perimeter shape andlarger in dimension relative to chip 202. For example, if chip 202 has asquare perimeter shape, shim 209 has a larger square central opening, asis exemplarily depicted in FIG. 2A. Likewise, if chip 202 has a hexagonperimeter shape shim 209 has a larger hexagonal concentric opening.Generally, neighboring members of shim 209 are arranged with one anotherto collectively surround the perimeter of chip 202 such that the chip202 is positioned within the opening. The members of shim 209 may befabricated from a high thermal conductivity material such as a metal,etc.

Seal-band material 205 may be an elastomeric, epoxy, adhesive, etc.material. Seal-band material 205 may be thermally compliant such thatseal-band material 205 may adsorb dimensional fluctuations of lid 216and/or carrier 208 due to thermal expansion. Generally, seal-bandmaterial 205 both mechanically joins and thermally connects the shim 209with lid 216 and carrier 208. Generally, the shape of seal band material205 is the same as the shape of shim 209 and includes the sameconcentric opening such that the seal band material 205 surrounds thechip 202 located within the concentric opening.

In one embodiment as is exemplarily shown in FIG. 2B, subsequent tothermally connecting lid 216 and chip 202, seal-band material 205 isformed upon the carrier 208 in the gap between the perimeter of lid 216and the carrier 208 surrounding the perimeter of chip 202. Subsequently,the shim 209 members are inserted upon the seal-band material 205 in thegap between the perimeter of lid 216 and seal-band material 205. Assuch, the seal-band material 205 mechanically joins and thermallyconnects the shim 209 and carrier 208. Subsequently, additionalseal-band material 205 (depicted in FIG. 2B as element 207) is s formedupon the carrier 208 in the gap between the perimeter of lid 216 and theshim 209 to mechanically join and thermally connect the shim 209 withlid 216. The seal-band material 205 may be formed by injecting theseal-band material upon the respective surfaces as described above.

In one embodiment as is exemplarily shown in FIG. 2C, subsequent tothermally connecting lid 216 and chip 202, the shim 209 members areinserted upon the carrier 208 in the gap between the perimeter of lid216 and carrier 208 to collectively surround the perimeter of chip 202.Subsequently, seal-band material 205 is formed upon the shim 209 to fillthe air gap that exists between shim 209 and the bottom surface of lid216. For example, the seal-band material 205 may be injected upon theshim 209 so that seal-band material 205 fills the air gap that existsbetween shim 209 and the bottom surface of lid 216.

The seal-band material 205 may be formed to be located upon at least twosurfaces of shim 209. For example, seal-band material 205 may be locatedupon the top surface, bottom surface, and side surfaces of shim 209.Alternatively, seal-band material 205 may be located upon the topsurface and upon the bottom surface of shim 209. Alternatively,seal-band material 205 may be located upon the top surface and upon oneor more side surfaces of shim 209.

The seal band 203 allows for warpage of electronic package 200 to bereduced since seal-band thicknesses 205 at the interface between shim209 and lid 216 and/or shim 209 and carrier 208 may be minimized.

Electronic package 200 may include thermal interface material 212 layersjuxtaposed between chip 202 and lid 216. Thermal interface material 212generally reduces air gaps between chip 202 and lid 216, therebyincreasing heat transfer away from chip 202. Thermal interface material212 may be a thermal gel, thermal compound, thermal paste, heat paste,and the like. In an embodiment, the thickness of thermal interfacematerials 212 is generally minimized. In certain embodiments, thermalinterface material 212 is composed of metallic materials, such assilicone rubber mixed with aluminum and zinc oxide. Other compliant basematerials other than silicone rubber and thermally conductive materialsmay be used.

FIG. 3A-FIG. 3C depict views of an exemplary electronic package 300.FIG. 3A and FIG. 3B depict alternative top views of electronic package300. FIG. 2C depicts a side view of electronic package 300. Electronicpackage 300 may include IC chip 202, carrier 208, interconnects 222 (notshown), underfill 210 (not shown), thermal interface material 212 (notshown), lid 216, and seal band 303. For clarity, some of the elements ofFIG. 3A-FIG. 3C are omitted in another FIG. 3A-FIG. 3C to better depictone or more features described below.

Seal band 303 generally fills the air gap that exists between theperimeter of lid 216 and carrier 208. Seal band 303 includes interleavedhigh compliant material 302 and low compliant material 304 applied uponcarrier 208 about the perimeter of chip 202. High compliant material 302is more compliant relative to low compliant material 304. That is, highcompliant material 302 better adsorbs dimensional fluctuations betweenlid 216 and carrier 208 due to thermal expansion, relative to lowcompliant material 304. In a particular embodiment, high compliantmaterial 302 may be an elastomeric material and low compliant material304 may be an epoxy. Generally, seal band 303 both mechanically joinsand thermally connects the lid 216 and carrier 208.

Seal band 303 is generally applied upon the carrier 208 prior to lid 216being thermally connected to chip 202. Seal band 303 is generallyapplied upon the carrier 208 around the perimeter of chip 202.Therefore, seal band 303 may have a similar perimeter shape relative tochip 202. For example, if chip 202 has a square perimeter shape sealband 303 also has a square perimeter shape, if chip 202 has a hexagonperimeter shape seal band 303 also has a hexagon perimeter shape. Sealband 303 includes a concentric opening of a similar perimeter shape andlarger in dimension relative to chip 202. For example, if chip 202 has asquare perimeter shape, seal band 303 has a larger square centralopening, as is exemplarily depicted in FIG. 3A. Likewise, if chip 202has a hexagon perimeter shape seal band 303 has a larger hexagonalconcentric opening. Generally, seal band 303 is applied to the carrier208 such that chip 202 is located within the seal band 303 opening.

Seal band 303 may be applied upon carrier 208 by first applying apattern of low compliant material 304 upon carrier 208 and subsequentlyapplying a pattern of high compliant material 302 upon carrier 208 suchthat the pattern of low compliant material 304 is interleaved with thepattern of high compliant material 302, or vice versa.

In one embodiment, the low compliant material 304 is patterned such thatthe low compliant material 304 is located at the corners of seal band303 and high compliant material 302 is interleaved there between, as isexemplarily shown in FIG. 3A. More specifically, low compliant material304 a-304 d are applied upon the carrier 208 forming the corners of sealband 303. High compliant material 302 pattern is then applied upon thecarrier between the low compliant material 304 pattern forming the sideboundaries of seal band 303. For example, high compliant material 302 ais applied upon carrier 208 between low compliant material 304 a and 304d, high compliant material 302 b is applied upon carrier 208 between lowcompliant material 304 a and 304 b, high compliant material 302 c isapplied upon carrier 208 between low compliant material 304 b and 304 c,and high compliant material 302 d is applied upon carrier 208 betweenlow compliant material 304 c and 304 d.

In another embodiment, the low compliant material 304 is patterned suchthat the low compliant material 304 is located at the corners of sealband 303 and at the bisection line of chip 202 and the high compliantmaterial 302 is interleaved there between, as is exemplarily shown inFIG. 3B. For example, low compliant material 304 a-304 d are appliedupon the carrier 208 forming the corners of seal band 303, low compliantmaterial 304 e is applied upon the carrier 208 between low compliantmaterial 304 a and 304 d, low compliant material 304 f is applied uponthe carrier 208 between low compliant material 304 a and 304 b, lowcompliant material 304 g is applied upon the carrier 208 between lowcompliant material 304 b and 304 c and low compliant material 304 h isapplied upon the carrier 208 between low compliant material 304 c and304 d. High compliant material 302 pattern is then applied upon thecarrier between the low compliant material 304 pattern. For example,high compliant material 302 a is applied upon carrier 208 between lowcompliant material 304 a and 304 e, high compliant material 302 b isapplied upon carrier 208 between low compliant material 304 f and 304 a,high compliant material 302 c is applied upon carrier 208 between lowcompliant material 304 b and 304 f, high compliant material 302 d isapplied upon carrier 208 between low compliant material 304 b and 304 g,high compliant material 302 e is applied upon carrier 208 between lowcompliant material 304 g and 304 c, high compliant material 302 f isapplied upon carrier 208 between low compliant material 304 c and 304 h,high compliant material 302 g is applied upon carrier 208 between lowcompliant material 304 h and 304 d, and high compliant material 302 h isapplied upon carrier 208 between low compliant material 304 d and 304 e.

The seal band 303 allows for warpage of electronic package 300 to bereduced by the high compliant material 302 adsorbing dimensionalfluctuations between lid 216 and carrier 208 while low compliantmaterial 304 provides the rigidity to adequately couple lid 216 andcarrier 208. In other words, the high compliant material 302 allows forthe expansion or contraction of the distance between lid 216 and carrier208 in sections of the seal band 303 while other sections of the sealband 303 maintains a generally fixed dimension and secure bond betweenlid 216 and carrier 208. In some embodiments, the quantity of lowcompliant material 304 portions in the interleaved pattern areminimized. In other words, the minimum number of low compliant material304 portions may be utilized to provide for adequate bonding between lid216 and carrier 208 while the high compliant material 302 portions aremaximized so as to provide for an increased proportion of seal band 303that allows for the expansion or contraction of the distance between lid216 and carrier 208.

In certain embodiments one or both of the low compliant material 304 andhigh compliant material 302 may be electrically conductive to allowelectrical grounding of a metal lid 216 to the carrier 208.

FIG. 4A depicts an isometric portion view of a topographic lid 410 thatincludes a plurality of perimeter surfaces at different topographiesrelative thereto. For clarity, only one corner of topographic lid 410 isdepicted in FIG. 4A. FIG. 4B and FIG. 4C depict views of an exemplaryelectronic package 400 including the topographic lid 410. FIG. 4Cdepicts view EE. Note, the topographic lid 410 that is depicted in FIG.4C is not shown in FIG. 4B, to better depict other elements ofelectronic package 400.

The topographic lid 410 includes a chip surface 412 that is configuredto thermally connect with chip 202 and a heat sink surface 415 that isconfigured to thermally connect with heat sink 104. Topographic lid 410also includes a perimeter surfaces 414 offset from chip surface 412 toreduce the dimension between the perimeter of lid 410 and carrier 208when lid 410 thermally contacts chip 202. Topographic lid 410 alsoincludes a perimeter corner surface 416 further offset from chip surface412 to further reduce the dimension between the corners of lid 410 andcarrier 208 when lid 410 thermally contacts chip 202. Therefore,topographic lid 410 has a plurality of flat surfaces at differenttopographies so that the topographic lid 410 thermally connects withchip 202 and provides for a reduction of thickness of the seal band 403that mechanically bonds and thermally connects topographic lid 410 tocarrier 208. In other words, the perimeter surfaces 414 and or cornersurfaces 416 are closer to carrier 208 relative to at least the chipsurface 412. Topographic lid 410 is configured to be mechanically bondedand thermally connected to carrier 208 by seal band 403 and may befabricated from a thermally conductive material, such as a metal. Forexample, topographic lid 410 may be formed (e.g., milled, cast, and thelike) from copper.

In embodiments, the topographic lid 410 has a similar perimeter shape ofgreater dimension relative to the perimeter shape of chip 202. Likewise,seal band 403 includes a concentric opening of a similar perimeter shapeand larger in dimension relative to chip 202. For example, if chip 202has a square perimeter shape, seal band 403 has a larger square centralopening, as is exemplarily depicted in FIG. 4B. Likewise, if chip 202has a hexagon perimeter shape seal band 403 has a larger hexagonalconcentric opening. Generally, seal band 403 is applied to the carrier208 such that chip 202 is located within the seal band 403 opening.

Seal band 403 generally fills the air gap that exists between theperimeter surfaces 414, 416 of lid 410 and carrier 208. Seal band 403may be the same materials as described with reference to seal band 120.Further, seal band 403 may be similar to seal band 203. In thisimplementation, seal band material may be applied upon the carrier 208about the perimeter of chip 202 prior to thermally attaching lid 410with chip 202. One or more shims may be placed upon the seal bandmaterial and additional seal band material may be applied upon theshims. For example, a generally straight shim may be located between thetop surface of carrier 208 and the perimeter surfaces 414. Further, sealband 403 may be similar to seal band 303. For example, low compliantmaterial portions may be patterned upon the carrier 208 such that thecorners surfaces 416 of lid 410 contact the low compliant materialportions. High compliant material portions may be patterned upon thecarrier 208 between low compliant material portions such that theperimeter surfaces 414 of lid 410 contact the high compliant materialportions.

FIG. 5A-FIG. 5E depict views of an exemplary electronic package 500.FIG. 5A depicts a top view of electronic package 500. FIG. 5B and FIG.5C depict cross section views of electronic package 500 at a particularfabrication stage. FIG. 5D and FIG. 5E depict cross section views ofelectronic package 500 at a preceding fabrication stage. Electronicpackage 500 may include IC chip 202, carrier 208, interconnects 222,underfill 210, thermal interface material 212, lid 216, frame 510, sealband 512, and bond material 520. For clarity, some of the elements ofFIG. 5A-FIG. 5E are omitted in another FIG. 5A-FIG. 5E so as to betterdepict one or more features described below.

In the present embodiment, the frame 510 is first attached to the lid216 with bond material 520 such as solder, epoxy or elastomer to form alid-frame assembly 530. Subsequently the lid-frame assembly 530 isthermally connected to the chip 202 via thermal interface material 212and connected to carrier 208 via seal band 512. The lid-frame assembly530 is initially placed on the chip 202 with the thermal interfacematerial 212 between the chip 202 and the lid 216, allowing a minimumthermal interface gap. The seal band material 512 is subsequentlydispensed on the carrier 208 about the perimeter of the chip 202 and thelid-frame assembly 530 is placed upon the seal band material 512 toconnect the lid-frame assembly 530 to the carrier 208. Subsequently, thelid-frame assembly 530 may be heated or mechanically loaded to move theframe 510 away from the lid 216 towards the chip carrier 208. Heating ofthe lid-frame assembly 530 may be necessary in order for the bondmaterial 520 to become compliant to allow the frame 510 to move relativeto lid 216. For example, if bond material 520 is solder, a solder reflowallows the bond material 520 to become compliant such that frame 520 maymove relative to lid 216. By moving the frame 510 toward carrier 208, asmall seal band material 512 gap is achieved, and warpage of electronicpackage 500 is reduced.

At a particular electronic package 500 fabrication stage seal band 512is formed upon carrier 208. Seal band 512 generally fills the air gapthat exists between the frame 510 and carrier 208. Seal band 512 may beformed of the same materials as described with reference to seal band120, seal band 303, etc. Seal band 512 material may be applied upon thecarrier 208 about the perimeter of chip 202 prior to mechanicallybonding and thermally connecting lid-frame assembly 530 to carrier 208.Seal band 512 includes a concentric opening of a similar perimeter shapeand larger in dimension relative to chip 202. For example, if chip 202has a square perimeter shape, seal band 512 has a larger square centralopening. Likewise, if chip 202 has a hexagon perimeter shape seal band512 has a larger hexagonal concentric opening. Generally, seal band 512is applied to the carrier 208 such that chip 202 is located within theseal band 512 opening.

Frame 510 may be a stiffening frame that once is mechanically bonded tocarrier 208 generally stiffens carrier 208. Frame 510 may improvecarrier 208 flatness. The flatness of carrier 208 at least partiallyallows for more efficient assembly or installation of multichip module500 to the next level of assembly (e.g. motherboard 106, heat sink 104,etc.). Frame 508 may be fabricated from materials with a desirablemechanical strength (e.g. copper, nickel, stainless steel, titanium,aluminum, molded plastics, ceramics, composites or combinations of each,etc.). Frame 510 may be made utilizing materials with a desirable CTE(e.g. similar CTE as carrier 208, etc.). Stiffening frame 202 may befabricated by forging, plating, stamping, molding, casting, machining,etc. a desired material.

Frame 510 includes a concentric opening. The concentric opening has ashape similar of greater dimension relative to chip 202. For example,the concentric opening is sufficiently large to accept large to acceptchip 202 being joined to carrier 208 and to accept lid 216 being joinedto chip 202. If chip 202 has a square perimeter shape, the concentricopening is a larger square opening. Likewise, if chip 202 has a hexagonperimeter shape the concentric opening is a larger hexagon opening.Generally, frame 510 is mechanically bonded and thermally connected tothe carrier 208 such that chip 202 is located within the concentricopening.

Frame 510 may include a single upper surface. For example, the uppersurface of frame 510 may be the only upper surface of frame 510 and maybe coplanar with lid 216 upon the lid 216 being thermally connected tochip 202. In this implementation, any cross section of the frame 510will appear as is exemplarily depicted in FIG. 5C. Alternatively, as isdepicted in FIG. 5D and FIG. 5E, frame 510 may have a plurality of uppersurfaces 511 and 513. As is shown in FIG. 5D, at cross section CC, frame510 has an upper surface 511 below the upper surface of frame 216. As isshown in FIG. 5E at cross section DD, frame 510 also has an uppersurface 513 that is coplanar with the upper surface of frame 216. Incertain embodiments coplanar upper surfaces 511 may exist on two sidesof frame 510 as is shown in FIG. 5A and in FIG. 5D. In otherembodiments, coplanar upper surfaces 511 may exist on all sides of frame510 such that upper surfaces 513 may exist on the corners of frame 510.In a particular implementation, frame 510 is a single member frame. Inother implementations, frame 510 is made up of multiple frame members.

Subsequently to moving the frame 510 towards carrier 208, or in otherwords when frame 510 is finally connected to carrier 208, the uppersurface of frame 510 may be lower than the upper surface of lid 216 ormay alternatively be coplanar with the upper surface of lid 216.

Lid 216 is located within the concentric opening of frame 510 so that agap 505 initially exists between the perimeter of lid 216 and frame 510.In other words, the lid 216 does not initially make mechanical or directthermal contact with frame 510. At a subsequent electronic package 500fabrication stage, the gap 505 is filled by bond material 520 such thatbond material 520 mechanically joins and thermally connects the lid 216with frame 510. As is shown in FIG. 5A, depicting cross section view CC,the bond material 520 may be located between frame 510 and lid 216 andupon the upper surface 511 of frame 510. The upper surface of bondmaterial 520 may be coplanar with the upper surface of lid 216 as isshown in the right side of FIG. 5B. The upper surface of bond material520 may be below the upper surface of lid 216 as is shown in the lefthand side. As is shown in FIG. 5C, depicting cross section view DD, thebond material 520 may be located between frame 510 and lid 216 andabsent from the upper surface 513 of frame 510. Bond material 520 is amaterial that provides mechanical bonding and transfers heat. Forexample, bond material 520 may be solder, epoxy, or elastomer, etc.

FIG. 6 depicts an exemplary method 250 of fabricating an electronicpackage 200. Once fabricated the electronic package 200 may be installedinto electronic device 100 by electrically connecting the electronicdevice to motherboard 106 via contacts 114 and by thermally connectingthe electronic device to heat sink 114 via thermal interface material118.

Method 250 begins at block 252 and continues with electrically attachingchip 202 to carrier 208 (block 254). In certain embodiments, chip 202 isattached using a flip-chip solder bump processes including a solderreflow. In other words, contacts 222 may be C4 contacts to electricallyconnect chip 202 and carrier 208.

Method 250 may continue by dispensing underfill 210 upon carrier 208around the perimeter of chip 202 at an ambient temperature (block 256).The underfill 210 may be drawn under the chip 202 between the chip 202and carrier 208 by capillary action. In some embodiments, underfill 210may be subject to curing at an elevated temperature. The curing ofunderfill 210 may or may not coincide with the curing of seal bandmaterial and/or thermal interface material.

Method 250 may continue with dispensing thermal interface material 212upon the top surface of chip 202. Method 250 may continue with aligninglid 216 with the chip 202 and thermally attaching the lid 216 with thethermal interface material 212 upon the top surface of chip 202. The lid216 is generally aligned to be concentric with the chip 202.

Method 250 may continue with filling the gap between carrier 208 and theperimeter of the lid 216 subsequent to the thermal joining of the lidand chip with seal band 203 (block 262). In this manner, lid 216 may bemechanically bonded and thermally connected to carrier 208 by seal band203. Seal band 203 includes a shim 209 and seal-band material 205.Therefore, method 250 may include placing a shim 209 between theperimeter of lid 216 and carrier 208 (block 264). Further, method 250may include applying seal-band material 205 between the perimeter of lid216 and carrier 208 (block 266).

In one implementation, subsequent to thermally connecting lid 216 andchip 202, seal-band material 205 is first formed upon the carrier 208 inthe gap between the perimeter of lid 216 and the carrier 208 surroundingthe perimeter of chip 202. Subsequently, shim 209 members are insertedupon the seal-band material 205 in the gap between the perimeter of lid216 and seal-band material 205. As such, the seal-band material 205mechanically joins and thermally connects the shim 209 and carrier 208.Subsequently, additional seal-band material 205 (depicted in FIG. 2B aselement 207) is s formed in the gap between the perimeter of lid 216 andthe shim 209 to mechanically join and thermally connect the shim 209with lid 216.

In another implementation, subsequent to thermally connecting lid 216and chip 202, shim 209 members are first inserted upon the carrier 208in the gap between the perimeter of lid 216 and carrier 208 to generallysurround the perimeter of chip 202. Subsequently, seal-band material 205is formed upon the shim 209 to fill the air gap that exists between shim209 and the bottom surface of lid 216. For example, the seal-bandmaterial 205 may be injected upon the shim 209 so that seal-bandmaterial 205 fills the air gap that exists between shim 209 and thebottom surface of lid 216. Depending upon the selected materials, acuring process may cure underfill 210, thermal interface material 212,and/or seal-band material 205, etc. Method 250 ends at block 268.

FIG. 7 depicts an exemplary method 350 of fabricating an electronicpackage 300. Once fabricated the electronic package 300 may be installedinto electronic device 100 by electrically connecting the electronicdevice to motherboard 106 via contacts 114 and by thermally connectingthe electronic device to heat sink 114 via thermal interface material118.

Method 350 begins at block 352 and continues with electrically attachingchip 202 to carrier 208 (block 354). In certain embodiments, chip 202 isattached using a flip-chip solder bump processes including a solderreflow. In other words, contacts 222 may be C4 contacts thatelectrically connect chip 202 and carrier 208.

Method 350 may continue by dispensing underfill 210 upon carrier 208around the perimeter of chip 202 at an ambient temperature (block 356).The underfill 210 may be drawn under the chip 202 between the chip 202and carrier 208 by capillary action. In some embodiments, underfill 210may be subject to curing at an elevated temperature. The curing ofunderfill 210 may or may not coincide with the curing of seal bandmaterials and/or thermal interface material.

Method 350 may continue with applying seal band 303 upon carrier 208about the perimeter and concentric with chip 202 (block 358). Seal band303 is applied upon the carrier 208 prior to lid 216 being thermallyconnected to chip 202. Seal band 303 may be applied upon carrier 208 byfirst applying a pattern of low thermally compliant material 304 uponcarrier 208 (block 360) and subsequently applying a pattern of highthermally compliant material 302 upon carrier 208 (block 362) such thatthe pattern of low thermally compliant material 304 is interleaved withthe pattern of high thermally compliant material 302, or vice versa(block 364). In one embodiment, the low thermally compliant material 304is patterned such that the low thermally compliant material 304 islocated at the corners of seal band 303 and high thermally compliantmaterial 302 is interleaved there between. In another embodiment, thelow thermally compliant material 304 is patterned such that the lowthermally compliant material 304 is located at the corners of seal band303 and at the bisection line of chip 202 and the high thermallycompliant material 302 is interleaved there between.

Method 350 may continue with dispensing thermal interface material 212upon the top surface of chip 202 (block 366). Method 350 may continuewith attaching the lid 216 to the chip 202 and to the seal band 303(block 368). The lid 216 may be attached by aligning lid 216 to beconcentric with the chip 202 and thermally attaching the lid 216 withthe thermal interface material 212 upon the top surface of chip 202(block 370) and mechanically and thermally attaching lid 216 with sealband 303 (block 372). Method 350 ends at block 376. Depending upon theselected materials, a curing process may cure underfill 210, thermalinterface material 212, and/or seal-band 303 material, etc.

FIG. 8 depicts an exemplary method 450 of fabricating an electronicpackage 400. Once fabricated the electronic package 400 may be installedinto electronic device 100 by electrically connecting the electronicdevice to motherboard 106 via contacts 114 and by thermally connectingthe electronic device to heat sink 114 via thermal interface material118.

Method 450 begins at block 452 and continues with electrically attachingchip 202 to carrier 208 (block 454). In certain embodiments, chip 202 isattached using a flip-chip solder bump processes including a solderreflow. In other words, contacts 222 may be C4 contacts thatelectrically connect chip 202 and carrier 208.

Method 450 may continue by dispensing underfill 210 upon carrier 208around the perimeter of chip 202 at an ambient temperature (block 456).The underfill 210 may be drawn under the chip 202 between the chip 202and carrier 208 by capillary action. In some embodiments, underfill 210may be subject to curing at an elevated temperature. The curing ofunderfill 210 may or may not coincide with the curing of seal bandmaterials and/or thermal interface material.

Method 450 may continue with applying seal band 403 upon carrier 208about the perimeter and concentric with chip 202 (block 358). Seal band403 may be applied upon the carrier 208 prior topographic lid 410 beingthermally connected to chip 202. Method 450 may continue with dispensingthermal interface material 212 upon the top surface of chip 202 (block460). Method 450 may continue with attaching topographic lid 410 to thechip 202 and to the seal band 403 (block 466). The topographic lid 410may be attached by aligning topographic lid 410 to be concentric withthe chip 202 and thermally attaching the topographic lid 410 with thethermal interface material 212 upon the top surface of chip 202 (block464) and mechanically and thermally attaching lid 216 with seal band 403(block 466). Method 450 ends at block 470. Depending upon the selectedmaterials, a curing process may cure underfill 210, thermal interfacematerial 212, and/or seal-band 403 material, etc.

FIG. 9 depicts an exemplary method 550 for installing an electronicpackage 500. Once fabricated, the electronic package 500 may beinstalled into electronic device 100 by electrically connecting theelectronic device to motherboard 106 via contacts 114 and by thermallyconnecting the electronic device to heat sink 114 via thermal interfacematerial 118.

Method 550 begins at block 552 and continues with electrically attachingthe chip 202 with the carrier 208 (block 554). In certain embodiments,chip 202 is attached using a flip-chip solder bump processes including asolder reflow. In other words, contacts 222 may be C4 contacts thatelectrically connect chip 202 and carrier 208.

Method 550 may continue by dispensing underfill 210 upon carrier 208around the perimeter of chip 202 at an ambient temperature (block 556).The underfill 210 may be drawn under the chip 202 between the chip 202and carrier 208 by capillary action. In some embodiments, underfill 210may be subject to curing at an elevated temperature. The curing ofunderfill 210 may or may not coincide with the curing of seal bandmaterials and/or thermal interface material. In some implementations thechip 202 may be electrically attached to carrier 208 and underfill 210applied between chip 202 and carrier 208 prior to attaching frame 510 tocarrier 208. Method 550 may continue with dispensing thermal interfacematerial 212 upon the top surface of chip 202 (block 558).

Method 550 may continue with connecting frame 510 and lid 216 withbonding material 520 (block 560). The connected frame 510 and lid 216generally form lid-frame assembly 530. Method 550 may continue withattaching lid-frame assembly 530 to carrier 208 and chip 202. Forexample, seal band 512 is formed upon carrier 208 about the perimeter ofthe chip 202. The lid-frame assembly 530 is connected to the carrier 208via contact with seal band 512 and the lid-frame assembly 530 isthermally connected to the chip via thermal interface material 212.Initially, the lid 216 is arranged with respect to the frame 510 suchthat a gap 505 exists between the lid 216 and the frame 510.Subsequently, the bond material 520 fills the gap 505 to connect the lid216 and frame.

Method 550 may continue by moving the frame 510 relative to the lid 216toward carrier 208 (block 566). For example, the lid-frame assembly 530may be heated or mechanically loaded to move the frame 510 away from thelid 216 towards the chip carrier 208. Heating of the lid-frame assembly530 may be necessary in order for the bond material 520 to becomecompliant to allow the frame 510 to move relative to lid 216. Forexample, if bond material 520 is solder, a solder reflow allows the bondmaterial 520 to become compliant such that frame 520 may move relativeto lid 216. By moving the frame 510 toward carrier 208, the thickness ofseal band 512 material is reduced thereby reducing potential warpage ofelectronic package 500. Method 550 ends at block 568.

In various embodiments, a method for installing an electronic package(e.g., electronic package 200,300, 400, 500, etc.) into an electronicdevice 100 includes electrically attaching the electronic package to asystem or mother board, applying a thermal interface material to theelectronic package, and thermally connecting a heat sink to theelectronic package. The thermal interface material may be injected,painted, spread, or otherwise applied to a top surface of the lidincluded within the electronic package. The heat sink may be attached tothe lid utilizing thermal interface material, thermal tape, epoxy,clip(s), stand offs, and the like. Generally, a force may be applied tosecure heat sink to electronic package.

The accompanying figures and this description depicted and describedembodiments of the present invention, and features and componentsthereof. Those skilled in the art will appreciate that any particularprogram nomenclature used in this description was merely forconvenience, and thus the invention should not be limited to use solelyin any specific application identified and/or implied by suchnomenclature.

The descriptions of the various embodiments of the present inventionhave been presented for purposes of illustration, but are not intendedto be exhaustive or limited to the embodiments disclosed. Manymodifications and variations will be apparent to those of ordinary skillin the art without departing from the scope and spirit of the describedembodiments. The terminology used herein was chosen to best explain theprinciples of the embodiment, the practical application or technicalimprovement over technologies found in the marketplace, or to enableothers of ordinary skill in the art to understand the embodimentsdisclosed herein.

References herein to terms such as “vertical”, “horizontal”, and thelike, are made by way of example, and not by way of limitation, toestablish a frame of reference. The term “horizontal” as used herein isdefined as a plane parallel to the conventional plane or surface of thecarrier 208, regardless of the actual spatial orientation of the carrier208. The term “vertical” refers to a direction perpendicular to thehorizontal, as just defined. Terms, such as “on”, “above”, “below”,“side” (as in “sidewall”), “higher”, “lower”, “over”, “beneath” and“under”, are defined with respect to the horizontal plane. It isunderstood that various other frames of reference may be employed fordescribing the present invention without departing from the spirit andscope of the present invention.

What is claimed is:
 1. A electronic package comprising: a carriercomprising a top surface and a bottom surface; a frame comprising anopening upon the carrier, the frame comprising a first frame side andsecond frame side, the first frame side comprising a top surfacecoplanar with a top surface of a lid and the second frame sidecomprising a top surface below the top surface of the lid; asemiconductor chip electrically connected to the top surface within andconcentric with the opening; the lid thermally connected to a topsurface of the semiconductor chip; and join material that connects thelid and the frame.
 2. The electronic package of claim 1, wherein thejoin material contacts a sidewall of the first frame side and a firstsidewall of the lid.
 3. The electronic package of claim 1, wherein thejoin material contacts a sidewall and the top surface of the secondframe side and a second sidewall of the lid.
 4. The electronic packageof claim 1, wherein the first sidewall of the lid opposes the secondsidewall of the lid.
 5. The electronic package of claim 1, wherein thejoin material is solder.
 6. The electronic package of claim 1, whereinthe join material is epoxy.
 7. The electronic package of claim 1,wherein the join material is elastomeric.
 8. The electronic package ofclaim 3, wherein a top surface of the join material that contacts thetop surface of the second frame side is coplanar with the top surface ofthe lid.